METHOD AND APPARATUS FOR THERMAL CONTROL OF PROCESSING NODES

摘要

An apparatus and method for per-node thermal control of processing nodes is disclosed. The apparatus includes a plurality of processing nodes, and further includes a power management unit configured to set a first frequency limit for at least one of the plurality of processing nodes responsive to receiving an indication of a first detected temperature greater than a first temperature threshold, wherein the first detected temperature is associated with the one of the plurality of processing nodes. The power management unit is further configured to set a second frequency limit for each of the plurality of processing nodes responsive to receiving an indication of a second temperature greater than a second temperature threshold.