DEVELOPMENT MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHY DEVICE

摘要

A high-grade development member is provided that has excellent filming resistance and excellent leak resistance despite having high conductivity. The development member comprises a conductive substrate, an elastic layer that is formed on the substrate, and a surface layer that covers the surface of the elastic layer. The surface layer comprises: the structure represented by structural formula (1) between two adjacent urethane bonds; a first resin comprising one or both of the structures selected from between the structure represented by structural formula (2) and the structure represented by structural formula (3); the structure represented by structural formula (4); a second resin comprising one or both of the structures selected from between the structure represented by structural formula (5) and the structure represented by structural formula (6); and an electron-conductive filler.