| 发明名称 |
ZINC OXIDE SINTERED COMPACT, SPUTTERING TARGET, AND ZINC OXIDE THIN FILM |
| 摘要 |
There is provided a zinc oxide sintered compact with a zirconium content of 10 to 1000 ppm, and a sputtering target containing the zinc oxide sintered compact. There is also provided a zinc oxide thin-film having a zirconium content of 10 to 2000 ppm and a resistivity of 10 ©·cm or greater. |
| 申请公布号 |
KR20140000688(A) |
申请公布日期 |
2014.01.03 |
| 申请号 |
KR20137011769 |
申请日期 |
2011.11.25 |
| 申请人 |
TOSOH CORPORATION |
发明人 |
MESUDA MASAMI;KURAMOCHI HIDETO;IIGUSA HITOSHI;OMI KENJI;SHIBUTAMI TETSUO |
| 分类号 |
C04B35/453;C23C14/08;H01B5/14;H01L21/316 |
主分类号 |
C04B35/453 |
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