PHOTORESISTS COMPRISING AMIDE COMPONENT

摘要

The present invention provides a novel photoresist composition including an amide group and multiple hydroxyl groups. A desirable photoresist of the present invention may include a resin with a photoacid-labile group, a photoacid generation compound, and an amide component having multiple hydroxyl groups capable of reducing the diffusion of an undesirable photoacid from the non-exposure area of a photoresist coating layer.