| 摘要 |
<p>A projection exposure apparatus (1) for projection lithography comprises a light source (3) for generating illumination light (4). An illumination optical unit (5) guides said light to an object field (14). A catadioptric projection optical unit (11) with at least one curved mirror images an object (7) in the object field (14) onto a substrate (13) in an image field (14a). An object displacement drive (7b) and a substrate displacement drive (13b) serve to displace the object (7) and the substrate (13). A compensation device (43, 44) serves to compensate aberrations of the projection optical unit (11), which are caused by an arching of the object (7) or the substrate (13). The compensation device (43, 44) comprises a wavelength manipulation device (44) for manipulating a wavelength of the illumination light (4) during the projection exposure. The result of this is a projection exposure apparatus in which the imaging quality of the projection optical unit is optimized, particularly taking into account a field curvature.</p> |
