PATTERN DRAWING DEVICE, PATTERN DRAWING METHOD

摘要

The uniformity of the illumination distribution of irradiation light (Re) on a substrate (S) may be improved for a pattern drawing device (1) wherein light incident on a spatial modulator (80) through a rod integrator (70) is modulated by a spatial light modulator (80) and irradiated onto the substrate (S). Provided is a light source array (60) having a plurality of light-emitting elements (601) which emits light with the brightness in accordance with the magnitude of a driving current (Id). The rod integrator (70) equalizes the illumination distribution for the light entering from the light source array (60). Also provided is an irradiation control unit (130) which individually controls the magnitude of the driving signal (Id) for each light-emitting element (601). Therefore, by individually controlling the brightness of the light-emitting element (601) the illumination distribution of the light incident on the subsequent rod integrator (70) can be suitably adjusted. As a result, it is possible to improve the uniformity of the illumination distribution of the irradiation light on an irradiation region (Re) using an optical head (6).