SUPPRESSION OF PARASITIC DEPOSITION IN A SUBSTRATE PROCESSING SYSTEM BY SUPPRESSING PRECURSOR FLOW AND PLASMA OUTSIDE SUBSTRATE REGION

摘要

A substrate processing system includes a shower head which has a base part and a stem part, and transmits precursor gas to a chamber. A collar connects the shower head to the upper surface of the chamber. The collar has multiple slots, is arranged around the stem part of the shower head, and directs purge gas toward an area between the base part of the shower head and the upper surface of the chamber through the multiple slots.