| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To ensure quick defective inspection when even fine defects on a mask substrate are desired to be detectable in the mask substrate which becomes an origin of an exposure mask. <P>SOLUTION: When the defective inspection is performed to the mask substrate which becomes the origin of the mask of exposure, an exposure region 13 is extracted after the mask pattern is formed from pattern data concerning the form of a mask pattern to be formed on the mask substrate, and the defective inspection must be performed only to a part before screening substrate corresponding to an exposure region 13. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
