发明名称 POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION
摘要 <p>A positive photosensitive siloxane composition containing: a polysiloxane (Ia), which is obtained by hydrolyzing and condensing the silane compound represented by RSi(OR1)3 in general formula (1) and the silane compound represented by Si(OR1)4 in general formula (2) in the presence of a basic catalyst, and a pre-baked film of which has a dissolution rate of 1,000Å/second or less in a 5 wt % TMAH aqueous solution; a polysiloxane (Ib), which is obtained by hydrolyzing and condensing at least the silane compound represented by general formula (1) in the presence of an acid or basic catalyst, and a pre-baked film of which has a dissolution rate of 100Å/second or more in a 2.38 wt % TMAH aqueous solution; and a diazonaphthoquinone derivative and solvent. (In the formula: R represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, in which any methylene may be replaced by oxygen, or represents an aryl group having 6 to 20 carbon atoms, in which any hydrogen may be replaced by fluorine; and R1 is an alkyl group having 1 to 5 carbon atoms.)</p>
申请公布号 KR20140000211(A) 申请公布日期 2014.01.02
申请号 KR20137007221 申请日期 2011.08.19
申请人 AZ ELECTRONIC MATERIALS IP (JAPAN) KK 发明人 YOKOYAMA DAISHI;FUKE TAKASHI;TASHIRO YUJI;SEKITO TAKASHI;NONAKA TOSHIAKI
分类号 G03F7/075;G03F7/004;G03F7/022;G03F7/039;H01L21/027 主分类号 G03F7/075
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