发明名称 |
GATE VALVE UNIT, SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD THEREOF |
摘要 |
A substrate processing device includes a depressurizable hot wall chamber having a sidewall with a temperature which becomes higher than room temperature and a first substrate transferring port provided in the sidewall, a depressurizable transfer chamber having a transfer arm mechanism and a second substrate transferring port, and a gate valve unit provided between the hot wall chamber and the transfer chamber. The gate valve unit includes: a housing having a sidewall provided with communicating holes, a first housing substrate transferring port, and a second housing substrate transferring port; a valve body which is elevatable in the housing; and a double sealing structure having a first sealing member and a second sealing member provided at an outer side of the first sealing member. The communicating holes communicate a gap between the first sealing member and the second sealing member with an internal space of the housing. |
申请公布号 |
US2014003892(A1) |
申请公布日期 |
2014.01.02 |
申请号 |
US201214005461 |
申请日期 |
2012.03.06 |
申请人 |
YAMAMOTO KAORU;HARA MASAMICHI;MIYASHITA TETSUYA;TOKYO ELECTRON LIMITED |
发明人 |
YAMAMOTO KAORU;HARA MASAMICHI;MIYASHITA TETSUYA |
分类号 |
F16K3/30;B65G49/00 |
主分类号 |
F16K3/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|