发明名称 SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
摘要 Semiconductor devices and methods of forming the semiconductor device are provided, the semiconductor devices including a first dielectric layer on a substrate, and a second dielectric layer on the first dielectric layer. The first dielectric layer has a carbon concentration lower than the second dielectric layer.
申请公布号 US2014001606(A1) 申请公布日期 2014.01.02
申请号 US201314020021 申请日期 2013.09.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LIM HA-JIN;JUNG HYUNG-SUK;CHOI YUN-KI
分类号 H01L29/02 主分类号 H01L29/02
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