发明名称 |
Apparatus and Method for Improved Control of Heating and Cooling of Substrates |
摘要 |
Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate. |
申请公布号 |
US2014004716(A1) |
申请公布日期 |
2014.01.02 |
申请号 |
US201314012473 |
申请日期 |
2013.08.28 |
申请人 |
KOELMEL BLAKE R.;TAM NORMAN L.;RANISH JOSEPH M. |
发明人 |
KOELMEL BLAKE R.;TAM NORMAN L.;RANISH JOSEPH M. |
分类号 |
H01L21/263 |
主分类号 |
H01L21/263 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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