发明名称 Fluid Handling Structure, Module for an Immersion Lithographic Apparatus, Lithographic Apparatus and Device Manufacturing Method
摘要 A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid.
申请公布号 KR101341927(B1) 申请公布日期 2014.01.02
申请号 KR20110083465 申请日期 2011.08.22
申请人 发明人
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
代理机构 代理人
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