发明名称 NIOBIUM THIN FILM STRESS RELIEVING LAYER FOR THIN-FILM SOLAR CELLS
摘要 A method of forming a photovoltaic device includes forming a thermal stress relieving layer on top of a substrate and forming a sacrificial back electrode metal layer on the thermal stress relieving layer. A semiconductor photon absorber layer is formed on the sacrificial back electrode metal layer, and the absorber layer is reacted with substantially an entire thickness of the sacrificial back electrode metal layer, thereby forming a back ohmic contact comprising a metallic compound of the sacrificial back electrode metal layer and the absorber layer, in combination with the thermal stress relieving layer.
申请公布号 US2014000712(A1) 申请公布日期 2014.01.02
申请号 US201213534519 申请日期 2012.06.27
申请人 CAO QING;LI ZHENGWEN;LIU FEI;ZHANG ZHEN;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CAO QING;LI ZHENGWEN;LIU FEI;ZHANG ZHEN
分类号 H01L31/0264;H01L31/18 主分类号 H01L31/0264
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