| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a developer coater capable of forming a resist pattern of a constant line thickness and a film thickness by a simple structure. <P>SOLUTION: A developer discharge nozzle 1 is long in the widthwise direction vertical to the advancing direction, and comprises a first developer discharging part 2 where a plurality of developer discharging openings 4 are arrayed in a line in the width direction, and a second developer discharging part 3 which is parallel to the first developer discharging part 2 and in which a plurality of developer discharging openings 5 are arrayed in a line in the width direction. The developer discharging openings 4 of the first developer discharging part 2 and the developer discharging openings 5 of the second developer discharging part 3 are so provided not to be overlapped with each other when viewed in the advancing direction. The developer discharging openings 4 and the developer discharging openings 5 are preferred to be spaced at constant intervals. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
