发明名称 SEMICONDUCTOR CIRCUIT PATTERN MEASURING APPARATUS AND METHOD
摘要 Included is a multiple resolution image generating unit which applies a plurality of noise removing filters to a semiconductor circuit pattern image and generates a multiple resolution image, a multiple resolution differential image generating unit which generates a multiple resolution differential image from a difference of images between hierarchies of the multiple resolution image, and a contour extracting unit which extracts a contour of the semiconductor circuit pattern based on an intensity signal of the semiconductor circuit pattern image. The contour extracting unit calculates an intensity signal level upon extracting a contour of the semiconductor circuit pattern from the multiple resolution image by using an image signal of the multiple resolution differential image, and extracts a contour of the semiconductor circuit pattern based on the calculated intensity signal level.
申请公布号 US2014003703(A1) 申请公布日期 2014.01.02
申请号 US201313868352 申请日期 2013.04.23
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SHIBAHARA TAKUMA;OIKAWA MICHIO;SAKAI KEI;YAMAGUCHI SATORU
分类号 G06T7/00 主分类号 G06T7/00
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