| 摘要 |
A method of manufacturing an optical component by forming an optical thin film on a substrate made of resin using either an ion assisted deposition method or a plasma assisted deposition method, and by controlling a first parameter, which includes at least one of gas flow amount, irradiation duration, and applied power of the ion assisted method or the plasma assisted method, according to a second parameter relevant to a radius of curvature of the substrate. |
