| 摘要 |
The present invention is to perform a cleaning process on an ion beam irradiation apparatus and to greatly improve the working efficiency of the apparatus at the same time. The ion beam irradiation apparatus includes a substrate transfer part (102) for performing a surface exchange process many times on an ion-beam-irradiated substrate between a cassette (7) and a process room (5), and ion beam supply part (101) for supplying an ion beam (3) to the process room. The inner part of the ion beam supply part (101) is cleaned by changing the setting of the operation parameter of the ion beam supply part (101) and performing the surface exchange process at least one time. [Reference numerals] (A,F) Cassette; (AA) Substrate 1; (B,D) Vacuum; (BB,EE) Process room; (C,E) Spare room; (CC,FF) Time; (DD) Substrate 2; (GG) Periodτ |
