发明名称 METHOD FOR MANUFACTURING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To obtain a photosensitive coating liquid having stable sensitivity even after long-term storage, and to provide a method for manufacturing a photosensitive composition improved in work efficiency and production efficiency. <P>SOLUTION: In the method for manufacturing the photosensitive composition containing at least a polymerizable polymer, a trihaloalkyl substituted compound and a sensitizing dye which sensitizes in a wavelength region of 380-1,300 nm, coating liquids of the photosensitive composition are separately prepared so that the trihaloalkyl substituted compound and the sensitizing dye do not exist together, and the coating liquids are stored, mixed before starting application, and applied. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006267339(A) 申请公布日期 2006.10.05
申请号 JP20050083247 申请日期 2005.03.23
申请人 MITSUBISHI PAPER MILLS LTD 发明人 MIYAZAKI TAKASHI;NAGAHAMA MASARU
分类号 G03F7/029;C08F290/12;G03F7/00;G03F7/004;G03F7/038 主分类号 G03F7/029
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