| 摘要 |
An apparatus for matching the variable impedance of an RF(Radio Frequency) transmission line is provided to make the impedance on the transmission line variable according to the size of a reflected wave by measuring the reflected wave returning to the transmission line. An apparatus for matching the variable impedance of an RF transmission line(20) includes an RF power generator(10), a first reflected sensor(60), a second reflected sensor(61), and a variable impedance matching device(50). The RF power generator(10) generates RF power needed in a semiconductor manufacturing process and transmits the RF power to a semiconductor manufacturing impedance matching device(30) through the transmission line(20) to supply the RF power to a semiconductor manufacturing device(40). The first reflected sensor(60) detects a reflected wave generated according to an impedance mismatch with the transmission line(20) on an input side of the semiconductor manufacturing impedance matching device(30). The second reflected sensor(61) is installed on a previous end of the semiconductor manufacturing impedance matching device(30) to measure the size of the reflected wave compared with forward output power. The variable impedance matching device(50) matches the impedance between the RF power generator(10) and the semiconductor manufacturing impedance matching device(30) through varying the impedance by the size of the reflected wave detected by the first and second reflected sensor(60,61). |
