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发明名称
半导体装置及半导体装置之制造方法
摘要
本发明系揭示一种半导体装置及半导体装置之制造方法,其目的系使布线或连接布线间之插塞等之内部所包含之锰扩散至该布线或连接插塞之上表面而产生矽酸锰膜,藉此可形成比先前之障壁膜低介电常数的障壁膜。在设置于绝缘膜11上之凹部12之内部所形成的导电体14上表面,形成藉由与形成于该导电体14上之氧化矽系绝缘膜21之反应而产生之矽酸锰膜22。
申请公布号
TW200737407
申请公布日期
2007.10.01
申请号
TW095141557
申请日期
2006.11.09
申请人
新力股份有限公司
发明人
荒川伸一
分类号
H01L21/768(2006.01)
主分类号
H01L21/768(2006.01)
代理机构
代理人
陈长文
主权项
地址
日本
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