| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning member that simply, surely, and sufficiently removes minute foreign matter, preferably foreign matter of a submicron level without causing stains at cleaning sites, and to provide a transfer member with a cleaning function that has the cleaning member, and a cleaning method for a substrate processing device that uses the cleaning member or the transfer member with a cleaning function. SOLUTION: The cleaning member 100 has a layered member provided with a plurality of column-structured protrusions on its surface. In this case, each column-structured protrusion 30 is a carbon-based nanostructure. A length of the maximum diameter of the carbon-based nanostructure is≤100 nm. COPYRIGHT: (C)2008,JPO&INPIT |
