发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 A substrate processing apparatus is provided to reduce generation of corrosion and contamination due to chemicals by transferring the chemicals to chemical collection ducts. A substrate(200) is loaded on a carrier(110). A bowl(120) is arranged at the outside of the carrier. The bowl includes chemical collection ducts(120a-120c) provided from the substrate. A chemical collection plate(150) is arranged around a lower part of the carrier to guide the chemicals supplied from the substrate to the chemical collection ducts. The chemical collection plate has a rotatable function. The chemical collection plate is rotated independently of the carrier. A first rotary shaft(140) includes a first motor(130) for rotating the carrier. A second rotary shaft(180) includes a second motor(160) for rotating the chemical collection plates. A power transmission unit transmits the rotatory power of the second motor to the second rotary shaft.
申请公布号 KR20080067059(A) 申请公布日期 2008.07.18
申请号 KR20070004162 申请日期 2007.01.15
申请人 SEMES CO., LTD. 发明人 KIM, JU WON
分类号 H01L21/687 主分类号 H01L21/687
代理机构 代理人
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