发明名称 INTEGRATED FILTER STRUCTURE HAVING IMPROVED INTERCHANNEL ISOLATION AND METHOD OF MANUFACTURE
摘要 In one embodiment, a filter structure includes first and second filter devices formed using a semiconductor substrate. A vertical ground plane structure prevents cross-coupling between the first and second filter devices.
申请公布号 KR101346003(B1) 申请公布日期 2013.12.31
申请号 KR20070066558 申请日期 2007.07.03
申请人 发明人
分类号 H03H7/01 主分类号 H03H7/01
代理机构 代理人
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