发明名称 |
Cleaning method, exposure method, and device manufacturing method |
摘要 |
A cleaning method includes cleaning a member, used at the time of exposing a substrate via liquid, which is in contact with the liquid. The method includes cleaning the member with an alkali solution followed by cleaning the member with a solution including hydrogen peroxide. |
申请公布号 |
US8619231(B2) |
申请公布日期 |
2013.12.31 |
申请号 |
US20100781211 |
申请日期 |
2010.05.17 |
申请人 |
WATANABE SHUNJI;NIKON CORPORATION |
发明人 |
WATANABE SHUNJI |
分类号 |
G03B27/52;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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