发明名称 Cleaning method, exposure method, and device manufacturing method
摘要 A cleaning method includes cleaning a member, used at the time of exposing a substrate via liquid, which is in contact with the liquid. The method includes cleaning the member with an alkali solution followed by cleaning the member with a solution including hydrogen peroxide.
申请公布号 US8619231(B2) 申请公布日期 2013.12.31
申请号 US20100781211 申请日期 2010.05.17
申请人 WATANABE SHUNJI;NIKON CORPORATION 发明人 WATANABE SHUNJI
分类号 G03B27/52;G03F7/20 主分类号 G03B27/52
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