发明名称 |
Liquid processing apparatus, liquid processing method, and storage medium |
摘要 |
A liquid processing apparatus processes an object to be processed W including a body part Wi and a plurality of projecting-shape parts Wm disposed on the body part Wi, with an inorganic film and a different film being laminated to each other. The liquid processing apparatus comprises: a support part 50 configured to support the body part Wi; a hydrophobic-liquid supply mechanism 30 configured to supply a hydrophobic liquid to the object to be processed W; and a rinse-liquid supply part 22 configured to supply a rinse liquid to the object to be processed W to which the hydrophobic liquid has been supplied. The hydrophobic-liquid supply mechanism 30 includes: a first hydrophobic-liquid supply part 32 configured to supply a first hydrophobic liquid for making hydrophobic the inorganic film; and a second hydrophobic-liquid supply part 37 configured to supply a second hydrophobic liquid for making hydrophobic the different film. |
申请公布号 |
US8617656(B2) |
申请公布日期 |
2013.12.31 |
申请号 |
US20100784744 |
申请日期 |
2010.05.21 |
申请人 |
NAKAMORI MITSUNORI;FUJITA AKIRA;TOSHIMA TAKAYUKI;TOKYO ELECTRON LIMITED |
发明人 |
NAKAMORI MITSUNORI;FUJITA AKIRA;TOSHIMA TAKAYUKI |
分类号 |
B05D3/10;B05D3/12 |
主分类号 |
B05D3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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