发明名称 Methods of forming diodes
摘要 Some embodiments include methods of forming diodes. A stack may be formed over a first conductive material. The stack may include, in ascending order, a sacrificial material, at least one dielectric material, and a second conductive material. Spacers may be formed along opposing sidewalls of the stack, and then an entirety of the sacrificial material may be removed to leave a gap between the first conductive material and the at least one dielectric material. In some embodiments of forming diodes, a layer may be formed over a first conductive material, with the layer containing supports interspersed in sacrificial material. At least one dielectric material may be formed over the layer, and a second conductive material may be formed over the at least one dielectric material. An entirety of the sacrificial material may then be removed.
申请公布号 US8617958(B2) 申请公布日期 2013.12.31
申请号 US201213685402 申请日期 2012.11.26
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ;SRINIVASAN BHASKAR
分类号 H01L21/8222 主分类号 H01L21/8222
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