发明名称 |
Substrate holding device,exposure apparatus having same .exposure method method for producing device and liquid repellent plate |
摘要 |
A substrate holder (PH) includes a base (PHB); a first holding portion (PH1) which is formed on the base (PHB) and which attracts and holds a substrate (P); and a second holding portion (PH2) which is formed on the base (PHB) and which attracts and holds a plate member (T) in the vicinity of the substrate (P) attracted and held by the first holding portion (PH1). In an exposure apparatus including such a substrate holder (PH), the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure. |
申请公布号 |
IL228755(D0) |
申请公布日期 |
2013.12.31 |
申请号 |
IL20130228755 |
申请日期 |
2013.10.06 |
申请人 |
NIKON CORPORATION;YUICHI SHIBAZAKI |
发明人 |
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分类号 |
H01L;G03F7/20;G03F9/00;H01L21/027;H01L21/68;H01L21/683 |
主分类号 |
H01L |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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