发明名称 |
Customized lithographic particles |
摘要 |
A method of producing particles includes providing a substrate structure that comprises a solid substrate; forming a target structure on said substrate structure, said target structure comprising a radiation-reactive material; forming a spatially patterned beam of radiation using a patterned mask; exposing at least a portion of the target structure to the spatially patterned beam of radiation to which the radiation-reactive material reacts while leaving other portions of the target structure unexposed to the radiation; removing substantially all of one of the exposed or the unexposed patterned portions of the target structure to provide a plurality of non-contiguous structures that include at least a portion of the radiation-reactive material; and separating the plurality of non-contiguous structures comprising the radiation-reactive material from the substrate structure into a fluid material. Each non-contiguous structure of the radiation-reactive material provides at least a portion of a separate particle after the separation. |
申请公布号 |
US8617798(B2) |
申请公布日期 |
2013.12.31 |
申请号 |
US20070377773 |
申请日期 |
2007.08.17 |
申请人 |
MASON THOMAS G.;HERNANDEZ CARLOS J.;THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
MASON THOMAS G.;HERNANDEZ CARLOS J. |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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