| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a graphic pattern dividing method capable of shortening a drawing time, by reducing the dividing number of a graphic pattern, and capable of reducing the drawing load for a device. <P>SOLUTION: This graphic pattern dividing method of the present invention for dividing the graphic pattern, when a resist layer of etching selectively a light-shielding film formed on a base material is irradiated, with an electron beam, specifies a process-dependent grid unit by using an L specified by r/2≤L≤r/3 as one side, where r represents a radius in corner rounding formed in an apex portion, when irradiated a rectangular graphic pattern is irradiated, developing it and etching it, determines all the process-dependent grid units existing within a border line of the graphic pattern and not contacting with the border line, and divides the graphic pattern, based on the process-dependent grid units determined. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
