RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

Disclosed is a resist composition wherein a base is generated by exposure and solubility for an alkali developing solution is enhanced by the actions of an acid, comprising: a base component (A) of which the solubility for an alkali developing solution is enhanced by actions of an acid; an acid compound component (G1) consisting of a nitrogen-containing cation with 7 or less of pKa and a counter anion; and a buffer component (K) consisting of a nitrogen-containing cation and a counter anion which becomes a conjugated base of an acid with 0-5 of pKa.