| 摘要 |
The present invention is a technology about nozzles of a spray apparatus which washes the surface of a substrate in a process for manufacturing a semiconductor and a flat panel display (FPD). The present invention relates to an apparatus for preventing the blockage of spray nozzles, which reduces the error rate of a product while increasing the efficiency of the washing process and the productivity of the product according to the blockage prevention of the spray nozzles because sludge is efficiently removed by periodically adding air shocks in a short time while spraying air to the sludge which is put in the spray nozzles at high pressure. A main composition according to an embodiment of the present invention includes: a spray pipe which pumps washing fluid; multiple nozzles which are installed at regular intervals in the spray pipe; an air housing which is installed in the spray pipe by being positioned in the opposed side of the nozzles and in which an air pipe to which air is supplied at high pressure is installed; and an actuator which is installed by being combined with the flange of the air housing and in which an operation rod is installed in the form of penetrating the air housing and the spray pipe. |
