发明名称 PRODUCTION PROCESS FOR HIGH PURITY POLYCRYSTAL SILICON AND PRODUCTION APPARATUS FOR THE SAME
摘要 In the production process of the present invention for high purity polycrystal silicon, using a vertical reactor having a silicon chloride gas-feeding nozzle and a reducing agent gas-feeding nozzle which are disposed at an upper part and a waste gas discharge pipe, a silicon chloride gas and a reducing agent gas are fed into the reactor to form polycrystal silicon at a tip part of the silicon chloride gas-feeding nozzle by the reaction of the silicon chloride gas with the reducing agent gas, and the polycrystal silicon is allowed to grow from the tip part of the silicon chloride gas-feeding nozzle toward a lower part thereof.
申请公布号 KR101345641(B1) 申请公布日期 2013.12.30
申请号 KR20060117033 申请日期 2006.11.24
申请人 发明人
分类号 C01B33/02;C30B15/00;C30B29/06 主分类号 C01B33/02
代理机构 代理人
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