| 摘要 |
<p>A process for cleaning an apparatus includes contacting the interior surface of the apparatus with cleaning compositions. The cleaning compositions include carboxylic acids derived from the ozonolysis of unsaturated compounds having between 6 to 24 carbons, where the ozonide formed by the ozonolysis undergoes an oxidative cleavage to form a mixture of monocarboxylic acids and dicarboxylic acids.</p> |
