METHOD FOR PREPARING ZINC OXIDE BASED TRANSPARENT CONDUCTIVE THIN FILM

摘要

A manufacturing method of a zinc oxide transparent conductive thin film is provided to improve the uniformity of the resistivity according to the location on a thin file surface. a manufacturing method of the zinc oxide transparent conductive thin film forms the zinc oxide transparent conductive thin film on materials by using a sputtering method. The size of the magnetic flux density applied at a sputtering target is 1.5 KG-4.5 KG range. The difference of the resistivity according to the location on the thin film surface is 10-50 % range of the maximum resistivity. The zinc oxide transparent conductive thin film has the resistivity of 2.00 x 10^4cm-5.00 x10^4Фcm range. The method is performed in the H2 mixed gas atmosphere of Ar or Ar and 0.1-10 vol%. The formed thickness of the thin film is 10-300nm range. The element furnace minor Al or Ga is added to the zinc oxide.