发明名称 BEAM PATTERN PROJECTOR WITH MODULATING ARRAY OF LIGHT SOURCES
摘要 This disclosure provides systems, methods and apparatus for a beam pattern projection device (100) that includes a modulating array of light sources (102). In one aspect, the beam pattern projection device (100) may include a lens (120). The array of light sources (102) can be positioned such that its output plane is substantially one focal length away from the lens (120) along the optical axis. The output of the array of light sources (102) can be controllable to create an adjustable beam pattern out of a plurality of possible beam patterns (450) that are each associated with a power level of each light source in the array of light sources. The device (100) can project at a distance the adjustable beam pattern created by the array of light sources (102).
申请公布号 WO2013192105(A1) 申请公布日期 2013.12.27
申请号 WO2013US46167 申请日期 2013.06.17
申请人 QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 HOLMAN, ROBERT L.;SAMPSELL, MATTHEW B.
分类号 G02B27/14;F21S8/10;F21V7/00;F21V14/00;G02B27/09 主分类号 G02B27/14
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