| 摘要 |
Provided is the under layer film excellent in the surface planarity. An under layer film-forming composition for imprints comprising a (meth)acrylic resin (A) containing an ethylenic unsaturated group(P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin(A) having an acid value of smaller than 1.0 mmol/g, and an under layer film-forming composition for imprints comprising a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B). |
