发明名称 |
MANUFACTURING METHOD AND MANUFACTURING DEVICE OF COMPOUND SEMICONDUCTOR SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method and a manufacturing device of a compound semiconductor substrate which can manufacture a substrate having an intended plane direction and less warpage by a simple method.SOLUTION: A manufacturing method of a compound semiconductor substrate 10 comprises steps of: preparing a plurality of holding parts 5 each having a holding surface 5d in which inclination of the holding surface 5d can be adjusted; causing the plurality of holding parts 5 to hold a plurality of compound semiconductor ingots 1, respectively; adjusting orientation of each of the plurality of ingots 1 by adjusting inclination of each of the holding surfaces 5d of the plurality of holding parts 5; and simultaneously cutting the plurality of ingots 1 to cut compound semiconductor substrates 10 each having an intended principal surface 2. |
申请公布号 |
JP2013258243(A) |
申请公布日期 |
2013.12.26 |
申请号 |
JP20120132828 |
申请日期 |
2012.06.12 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
NAKAYAMA MASAHIRO |
分类号 |
H01L21/304;B24B27/06;B28D5/04;B28D7/04 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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