TIN OXIDE POWDER FOR ITO SPUTTERING TARGET, METHOD OF MANUFACTURING MIXED POWDER OF TIN OXIDE AND INDIUM OXIDE FOR ITO SPUTTERING TARGET, AND SINTERED BODY FOR ITO SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide: an ITO sintered compact that is suitable for forming an ITO film and that excels in further high density and component uniformity; and a tin oxide powder and a mixed powder of the tin oxide powder and an indium oxide that are suitable for a raw material of the ITO sintered compact.SOLUTION: A tin oxide raw material powder is ground by a wet process bead mill until becoming such that D50 is in a range exceeding 0.4 μm and at most 1.1 μm, D90 is at most 2.5 μm, and a BET specific surface area is at least 13 m/g, and a mixed powder slurry that mixes an obtained tin oxide powder and an indium oxide powder is ground by a wet process bead mill until becoming such that D50 is in a range exceeding 0.4 μm and at most 0.5 μm, D90 is at least 1.0 μm, and a BET specific surface area is at least 12.3 m/g.