发明名称 PLASMA PROCESSING APPARATUS, AND PROBE DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce timing fluctuation in electric characteristic sampling in a high-frequency power modulation type device.SOLUTION: In a plasma processing apparatus 10, ON and OFF states of a high-frequency power are switched to supply the high-frequency power to one of an upper electrode 30 and a lower electrode 16. A probe detector Pd measures electrical characteristics in a power feeding line 58 to generate a measurement signal, and a processing part PU of a probe device PA performs sampling of the measurement signal to generate a sample value. The processing part receives a pulse signal corresponding to the switching of the ON and OFF states of the high-frequency power, performs the sampling of the measurement signal at a predetermined sampling interval to generate one or more sample values during from when a predetermined mask time period lapses from a rising timing of a pulse of the pulse signal to a falling timing of the pulse. Among the one or more sampling values, one or more sample values obtained by the final one or more sampling to the falling timing are adopted as a detection value.
申请公布号 JP2013257977(A) 申请公布日期 2013.12.26
申请号 JP20120132030 申请日期 2012.06.11
申请人 TOKYO ELECTRON LTD 发明人 HIRANO TAICHI;SATO KENJI
分类号 H05H1/46;H01L21/3065;H05H1/00 主分类号 H05H1/46
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