GENERATION METHOD OF CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, GENERATION UNIT OF CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, AND SUBSTRATE PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To stabilize the processing capacity of a chemical liquid supplied to a substrate.SOLUTION: A substrate processing system 1 includes: a chemical liquid generation unit 3 which generates a chemical liquid supplied to a substrate W; and a process unit 2 which supplies the chemical liquid generated by the chemical liquid generation unit 3 to the substrate W. The chemical liquid generation unit 3 supplies an oxygen containing gas containing an oxygen gas to a TMAH containing chemical liquid including tetramethylammonium hydroxide (TMAH) thereby dissolving the oxygen containing gas into the TMAH containing chemical liquid.