METHOD AND DEVICE FOR FORMING TEXTURE

摘要

PROBLEM TO BE SOLVED: To provide a good controlling method, in a method for forming a texture by air layer etching using CIF3 gas.SOLUTION: A method for forming a texture includes: a first step of exposing a silicon substrate mounted on a stage in a chamber to CIF3-containing gas; a second step of detecting color change at a substrate surface on a side exposed to the CIF3-containing gas of the silicon substrate; and a third step of changing processing conditions or ending processing according to the color change. The problem can be solved by changing processing conditions or ending processing according to color change of a substrate.