发明名称 Cu−Ga系スパッタリングターゲット
摘要 Disclosed is a Cu-Ga sputtering target, wherein the ratio of the number of the atoms of gallium (Ga) to the total number of the atoms of gallium (Ga) and copper (Cu), i.e., (Ga/(Ga+Cu)), is 0.2-0.6, and an alkali metal is contained. With the Cu-Ga target, additional manufacture of a layer that blocks diffusion of Na from an Na-containing layer and an Na-containing substrate is not required at the time of manufacturing the CIGS solar cell, and the concentration of the alkali metal in the CIGS layer can be made relatively uniform. A method for manufacturing the target, a light absorbing layer manufactured using the target, and the CIGS solar cell using the light absorbing layer are also provided.
申请公布号 JP5923569(B2) 申请公布日期 2016.05.24
申请号 JP20140177040 申请日期 2014.09.01
申请人 JX金属株式会社 发明人 生澤 正克;高見 英生;田村 友哉
分类号 C23C14/34;B22F5/00;C22C9/00;C22C28/00;H01L31/0749;H01L31/18 主分类号 C23C14/34
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