发明名称 |
PHOTORESISTS COMPRISING AMIDE COMPONENT |
摘要 |
New photoresist compositions are provided that comprise a component that comprises an amide group and multiple hydroxyl groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and an amide component with multiple hydroxyl groups that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer |
申请公布号 |
US2013344439(A1) |
申请公布日期 |
2013.12.26 |
申请号 |
US201313926764 |
申请日期 |
2013.06.25 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
LIU CONG;WU CHUNYI;POHLERS GERHARD;PROKOPOWICZ GREGORY P.;LI MINGQI;XU CHENG-BAI |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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