发明名称 METHOD FOR OBTAINING DATA OF SUBSTRATE PROCESSING APPARATUS AND SENSOR SUBSTRATE
摘要 According to an embodiment of the present invention, a data obtainment method for obtaining data on gas flow directions in a plurality of measurement regions in a surface of a substrate loaded onto a loading unit of a substrate processing apparatus is provided. The method includes loading a sensor substrate onto the loading unit in a first direction, and changing the first direction into a second direction. Further, it is obtained a vector data of a gas flow in a first straight direction and a vector data of a gas flow in a second straight direction from each first sensor of the sensor substrate loaded in the first and second directions. Also, the method includes calculating a gas flow direction at each starting point in the first and second measurement regions by combining the vector data.
申请公布号 US2013346018(A1) 申请公布日期 2013.12.26
申请号 US201313923501 申请日期 2013.06.21
申请人 TOKYO ELECTRON LIMITED 发明人 AKADA HIKARU
分类号 G01P13/00 主分类号 G01P13/00
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