| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of manufacturing a resist pattern having an excellent shape.SOLUTION: A resist composition includes: a resin having a structural unit represented by a formula (I) and a structural unit containing an acid unstable group; and an acid generating agent represented by a formula (II). [In the formulas, Arepresents a single bond,-A-O-,-A-CO-O-, or the like, * represents a bond with -O-, Arepresents alkanediyl; Qand Qeach represent independently a fluorine atom or a 1-6C perfluoroalkyl group; Lrepresents a 1-17C divalent saturation hydrocarbon group; a nucleus W represents an alicyclic hydrocarbon ring; Rand Reach represent independently a fluorine atom or a 1-6C fluoroalkyl group; s represents an integer of 1-10; and Zrepresents organic cation.] |
