PLASMA PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, ANTENNA STRUCTURE, AND PLASMA GENERATING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of simplifying the structure of the apparatus and preventing the deterioration of the plasma generation efficiency.SOLUTION: A plasma processing apparatus 10 includes: a chamber 11; a placement base 12 disposed in the chamber 11 and on which a substrate S is placed; an ICP antenna 13 which is disposed at the exterior of the chamber 11 so as to face the placement base 12 and is connected with a high frequency power source 26; a window member 14 which forms a wall part of the chamber 11 facing the ICP antenna 13, is disposed between the placement base 12 and the ICP antenna 13, and is formed by a conductor; and a conducting wire 28 connected with the window member 14 at both ends. The window member 14 and the conducting wire 28 form a closed circuit, and the conducting wire 28 includes a capacitor 29.