发明名称 PHOTOCURABLE COMPOSITION, BARRIER LAYER COMPRISING THE SAME AND ENCAPSULATED APPARATUS COMPRISING THE SAME
摘要 The present invention relates to a photocurable composite, a barrier layer including the same, a barrier stack including the same, an encapsulated device including the same, an encapsulating method of a device using the same. The photocurable composite includes (A) a photocurable monomer and (B) silicon-containing monomer.
申请公布号 KR20130141353(A) 申请公布日期 2013.12.26
申请号 KR20130004179 申请日期 2013.01.14
申请人 CHEIL INDUSTRIES INC. 发明人 LEE, CHANG MIN;CHOI, SEUNG JIB;KWON, JI HYE;LEE, YEON SOO;HA, KYOUNG JIN
分类号 G03F7/075;C08L83/04;G03F7/027;H01L51/50 主分类号 G03F7/075
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