| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical vapor deposition apparatus of vertical facing substrate mounting system also applicable to production of a nitride-based group III-V semiconductor wafer, in which attachment and detachment, carry-in and carry-out of a substrate can be simplified.SOLUTION: In a chemical vapor deposition apparatus 10, a pair of susceptors 2 on which a substrate 1 is mounted are fitted, respectively, to liners 9 with no gap thus forming planes, and then the planes are made to face each other thus forming a gas passage 15. Back faces of the pair of susceptors 2 are secured, respectively, onto the surfaces of susceptor support bases 3. The susceptor support bases 3 are surrounded by the liners 9 and airtight holding walls. An enclosure 11 is provided so as to cover the whole outer surface constituted of the liners 9, the airtight holding walls and the gas passage 15. An outer housing 18 is constituted of the enclosure 11 and the liners 9. Bodies are constituted by integrating a pair of portions other than the outer housing 18, respectively. The outer housing 18 and the bodies 19 can be attached and detached. |
