| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique advantageous when transferring a pattern of reticle, with high accuracy, to a pattern formed on a substrate, in a scanning exposure device.SOLUTION: In the scanning exposure device for individually exposing a plurality of partial regions included, respectively, in a plurality of first regions of a substrate, a pattern is formed on the substrate via a step for performing exposure with respect to each first region as a shot region, the plurality of partial regions include first partial regions and second partial regions, the scanning exposure device includes a control unit for controlling the exposure operation of each partial region, the control unit controls the exposure operation so as to expose the first partial regions while aligning the substrate and a reticle by using the detection results of a plurality of marks formed in the first partial regions, and to expose the second partial regions while aligning the substrate and the reticle by using the detection results of a plurality of marks formed in the second partial regions. |
